Nanomechanical parameters of new carbazolyle-containing photoresist polymers

The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate...

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Autor principal:	Palistrant, Natalia
Formato:	article
Lenguaje:	EN
Publicado:	D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2005
Materias:	Physics QC1-999 Electronics TK7800-8360
Acceso en línea:	https://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e
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spelling	oai:doaj.org-article:406632edf5c54e3fa22d67c73a67e00e2021-11-21T12:11:31ZNanomechanical parameters of new carbazolyle-containing photoresist polymers2537-63651810-648Xhttps://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e2005-12-01T00:00:00Zhttps://mjps.nanotech.md/archive/2005/article/3366https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate the nanomechanical parameters of polymer films. The reliability of the chosen analytical method was checked using number of repeats. The influence of chemical composition, action of UF-light and aging on the nanomechanical properties of CAM: OMA and PEPC were investigated. Palistrant, NataliaD.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 4, Iss 4, Pp 468-472 (2005)
institution	DOAJ
collection	DOAJ
language	EN
topic	Physics QC1-999 Electronics TK7800-8360
spellingShingle	Physics QC1-999 Electronics TK7800-8360 Palistrant, Natalia Nanomechanical parameters of new carbazolyle-containing photoresist polymers
description	The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate the nanomechanical parameters of polymer films. The reliability of the chosen analytical method was checked using number of repeats. The influence of chemical composition, action of UF-light and aging on the nanomechanical properties of CAM: OMA and PEPC were investigated.
format	article
author	Palistrant, Natalia
author_facet	Palistrant, Natalia
author_sort	Palistrant, Natalia
title	Nanomechanical parameters of new carbazolyle-containing photoresist polymers
title_short	Nanomechanical parameters of new carbazolyle-containing photoresist polymers
title_full	Nanomechanical parameters of new carbazolyle-containing photoresist polymers
title_fullStr	Nanomechanical parameters of new carbazolyle-containing photoresist polymers
title_full_unstemmed	Nanomechanical parameters of new carbazolyle-containing photoresist polymers
title_sort	nanomechanical parameters of new carbazolyle-containing photoresist polymers
publisher	D.Ghitu Institute of Electronic Engineering and Nanotechnologies
publishDate	2005
url	https://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e
work_keys_str_mv	AT palistrantnatalia nanomechanicalparametersofnewcarbazolylecontainingphotoresistpolymers
_version_	1718419117353992192

Nanomechanical parameters of new carbazolyle-containing photoresist polymers

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