Nanomechanical parameters of new carbazolyle-containing photoresist polymers
The new photopolymer layers from carbazolemethacrylates (CAM) with oktylmethacrylates (OMA) and polyepoxypropylcarbazole (PEPC) were prepared and investigated by us. Load and depth sensing indentation with a Berkovich indenter were performed in order to evaluate...
Saved in:
| Main Author: | |
|---|---|
| Format: | article |
| Language: | EN |
| Published: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2005
|
| Subjects: | |
| Online Access: | https://doaj.org/article/406632edf5c54e3fa22d67c73a67e00e |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|