Atomic layer etching of graphene through controlled ion beam for graphene-based electronics
Abstract The electronic and optical properties of graphene are greatly dependent on the the number of layers. For the precise control of the graphene layers, atomic layer etching (ALE), a cyclic etching method achieved through chemical adsorption and physical desorption, can be the most powerful tec...
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| Auteurs principaux: | , , , , , , |
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| Format: | article |
| Langue: | EN |
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Nature Portfolio
2017
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| Accès en ligne: | https://doaj.org/article/4339ca8c9383416699decb6ebe553787 |
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