Shadow-wall lithography of ballistic superconductor–semiconductor quantum devices

Shadow-wall lithography of ballistic superconductor–semiconductor quantum devices

Advanced fabrication techniques enable a wide range of quantum devices, such as the realization of a topological qubit. Here, the authors introduce an on-chip fabrication technique based on shadow walls to implement topological qubits in an InSb nanowire without fabrication steps such as lithography...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Sebastian Heedt, Marina Quintero-Pérez, Francesco Borsoi, Alexandra Fursina, Nick van Loo, Grzegorz P. Mazur, Michał P. Nowak, Mark Ammerlaan, Kongyi Li, Svetlana Korneychuk, Jie Shen, May An Y. van de Poll, Ghada Badawy, Sasa Gazibegovic, Nick de Jong, Pavel Aseev, Kevin van Hoogdalem, Erik P. A. M. Bakkers, Leo P. Kouwenhoven
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
Science
Q
Acceso en línea:https://doaj.org/article/4342ea1879844c8391fb3d3c53b33006
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Internet

https://doaj.org/article/4342ea1879844c8391fb3d3c53b33006

Ejemplares similares