Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation

Abstract We synthesised a crystalline MoS2 film from as-sputtered amorphous film by applying an electron beam irradiation (EBI) process. A collimated electron beam (60 mm dia.) with an energy of 1 kV was irradiated for only 1 min to achieve crystallisation without an additional heating process. Afte...

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Autores principales:	Bong Ho Kim, Hyun Ho Gu, Young Joon Yoon
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2017
Materias:	Medicine R Science Q
Acceso en línea:	https://doaj.org/article/4b30a12fc99545f49eba9bf49b546bff
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spelling	oai:doaj.org-article:4b30a12fc99545f49eba9bf49b546bff2021-12-02T12:30:45ZAtomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation10.1038/s41598-017-04222-62045-2322https://doaj.org/article/4b30a12fc99545f49eba9bf49b546bff2017-06-01T00:00:00Zhttps://doi.org/10.1038/s41598-017-04222-6https://doaj.org/toc/2045-2322Abstract We synthesised a crystalline MoS2 film from as-sputtered amorphous film by applying an electron beam irradiation (EBI) process. A collimated electron beam (60 mm dia.) with an energy of 1 kV was irradiated for only 1 min to achieve crystallisation without an additional heating process. After the EBI process, we observed a two-dimensional layered structure of MoS2 about 4 nm thick and with a hexagonal atomic arrangement on the surface. A stoichiometric MoS2 film was confirmed to grow well on SiO2/Si substrates and include partial oxidation of Mo. In our experimental configuration, EBI on an atomically thin MoS2 layer stimulated the transformation from a thermodynamically unstable amorphous structure to a stable crystalline nature with a nanometer grain size. We employed a Monte Carlo simulation to calculate the penetration depth of electrons into the MoS2 film and investigated the atomic rearrangement of the amorphous MoS2 structure.Bong Ho KimHyun Ho GuYoung Joon YoonNature PortfolioarticleMedicineRScienceQENScientific Reports, Vol 7, Iss 1, Pp 1-11 (2017)
institution	DOAJ
collection	DOAJ
language	EN
topic	Medicine R Science Q
spellingShingle	Medicine R Science Q Bong Ho Kim Hyun Ho Gu Young Joon Yoon Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
description	Abstract We synthesised a crystalline MoS2 film from as-sputtered amorphous film by applying an electron beam irradiation (EBI) process. A collimated electron beam (60 mm dia.) with an energy of 1 kV was irradiated for only 1 min to achieve crystallisation without an additional heating process. After the EBI process, we observed a two-dimensional layered structure of MoS2 about 4 nm thick and with a hexagonal atomic arrangement on the surface. A stoichiometric MoS2 film was confirmed to grow well on SiO2/Si substrates and include partial oxidation of Mo. In our experimental configuration, EBI on an atomically thin MoS2 layer stimulated the transformation from a thermodynamically unstable amorphous structure to a stable crystalline nature with a nanometer grain size. We employed a Monte Carlo simulation to calculate the penetration depth of electrons into the MoS2 film and investigated the atomic rearrangement of the amorphous MoS2 structure.
format	article
author	Bong Ho Kim Hyun Ho Gu Young Joon Yoon
author_facet	Bong Ho Kim Hyun Ho Gu Young Joon Yoon
author_sort	Bong Ho Kim
title	Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
title_short	Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
title_full	Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
title_fullStr	Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
title_full_unstemmed	Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation
title_sort	atomic rearrangement of a sputtered mos2 film from amorphous to a 2d layered structure by electron beam irradiation
publisher	Nature Portfolio
publishDate	2017
url	https://doaj.org/article/4b30a12fc99545f49eba9bf49b546bff
work_keys_str_mv	AT bonghokim atomicrearrangementofasputteredmos2filmfromamorphoustoa2dlayeredstructurebyelectronbeamirradiation AT hyunhogu atomicrearrangementofasputteredmos2filmfromamorphoustoa2dlayeredstructurebyelectronbeamirradiation AT youngjoonyoon atomicrearrangementofasputteredmos2filmfromamorphoustoa2dlayeredstructurebyelectronbeamirradiation
_version_	1718394332658008064

Atomic rearrangement of a sputtered MoS2 film from amorphous to a 2D layered structure by electron beam irradiation

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