Boron-Doped Diamond/GaN Heterojunction—The Influence of the Low-Temperature Deposition

We report a method of growing a boron-doped diamond film by plasma-assisted chemical vapour deposition utilizing a pre-treatment of GaN substrate to give a high density of nucleation. CVD diamond was deposited on GaN substrate grown epitaxially via the molecular-beam epitaxy process. To obtain a con...

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Bibliographic Details
Main Authors: Michał Sobaszek, Marcin Gnyba, Sławomir Kulesza, Mirosław Bramowicz, Tomasz Klimczuk, Robert Bogdanowicz
Format: article
Language:EN
Published: MDPI AG 2021
Subjects:
AFM
T
Online Access:https://doaj.org/article/4c24603b3c5746c3bfe75322db523abc
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