Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings...
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EDP Sciences
2021
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oai:doaj.org-article:4d38697559564c00aca8dc12e358d4eb2021-12-02T17:12:51ZWide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation2100-014X10.1051/epjconf/202125512014https://doaj.org/article/4d38697559564c00aca8dc12e358d4eb2021-01-01T00:00:00Zhttps://www.epj-conferences.org/articles/epjconf/pdf/2021/09/epjconf_eosam2021_12014.pdfhttps://doaj.org/toc/2100-014XWe report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application.Lee Mane-Si LaureCholet JulieDelboulbé AnneGuillemet RaphaëlLoiseaux BrigitteGarabedian PatrickFlügel-Paul ThomasBenkenstein TinoSadlowski SusannTetaz NicolasWindpassinger RomanMahalik SarojEDP SciencesarticlePhysicsQC1-999ENEPJ Web of Conferences, Vol 255, p 12014 (2021) |
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Physics QC1-999 |
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Physics QC1-999 Lee Mane-Si Laure Cholet Julie Delboulbé Anne Guillemet Raphaël Loiseaux Brigitte Garabedian Patrick Flügel-Paul Thomas Benkenstein Tino Sadlowski Susann Tetaz Nicolas Windpassinger Roman Mahalik Saroj Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
description |
We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application. |
format |
article |
author |
Lee Mane-Si Laure Cholet Julie Delboulbé Anne Guillemet Raphaël Loiseaux Brigitte Garabedian Patrick Flügel-Paul Thomas Benkenstein Tino Sadlowski Susann Tetaz Nicolas Windpassinger Roman Mahalik Saroj |
author_facet |
Lee Mane-Si Laure Cholet Julie Delboulbé Anne Guillemet Raphaël Loiseaux Brigitte Garabedian Patrick Flügel-Paul Thomas Benkenstein Tino Sadlowski Susann Tetaz Nicolas Windpassinger Roman Mahalik Saroj |
author_sort |
Lee Mane-Si Laure |
title |
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
title_short |
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
title_full |
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
title_fullStr |
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
title_full_unstemmed |
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation |
title_sort |
wide band uv/vis/nir blazed-binary reflective gratings: two lithographic techniques investigation |
publisher |
EDP Sciences |
publishDate |
2021 |
url |
https://doaj.org/article/4d38697559564c00aca8dc12e358d4eb |
work_keys_str_mv |
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