Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation

We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings...

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Autores principales: Lee Mane-Si Laure, Cholet Julie, Delboulbé Anne, Guillemet Raphaël, Loiseaux Brigitte, Garabedian Patrick, Flügel-Paul Thomas, Benkenstein Tino, Sadlowski Susann, Tetaz Nicolas, Windpassinger Roman, Mahalik Saroj
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Publicado: EDP Sciences 2021
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Acceso en línea:https://doaj.org/article/4d38697559564c00aca8dc12e358d4eb
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spelling oai:doaj.org-article:4d38697559564c00aca8dc12e358d4eb2021-12-02T17:12:51ZWide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation2100-014X10.1051/epjconf/202125512014https://doaj.org/article/4d38697559564c00aca8dc12e358d4eb2021-01-01T00:00:00Zhttps://www.epj-conferences.org/articles/epjconf/pdf/2021/09/epjconf_eosam2021_12014.pdfhttps://doaj.org/toc/2100-014XWe report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application.Lee Mane-Si LaureCholet JulieDelboulbé AnneGuillemet RaphaëlLoiseaux BrigitteGarabedian PatrickFlügel-Paul ThomasBenkenstein TinoSadlowski SusannTetaz NicolasWindpassinger RomanMahalik SarojEDP SciencesarticlePhysicsQC1-999ENEPJ Web of Conferences, Vol 255, p 12014 (2021)
institution DOAJ
collection DOAJ
language EN
topic Physics
QC1-999
spellingShingle Physics
QC1-999
Lee Mane-Si Laure
Cholet Julie
Delboulbé Anne
Guillemet Raphaël
Loiseaux Brigitte
Garabedian Patrick
Flügel-Paul Thomas
Benkenstein Tino
Sadlowski Susann
Tetaz Nicolas
Windpassinger Roman
Mahalik Saroj
Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
description We report on subwavelength reflective gratings for hyperspectral applications operating in the 340 nm-1040 nm spectral range. The blazed grating period is 30 μm and is composed of 2D subwavelength binary structures with sizes in-between 120 nm and 350 nm. We demonstrate the manufacturing of gratings on 3” wafers by two lithography technologies (e-beam or nanoimprint) followed by dry etching process. These subwavelength gratings enable broadband efficiency which is in average 15%-20% above the efficiency requirement for next generation of spectro-imagers for Earth observation missions and a wavefront error that is much smaller than the 100 nm requirement for space application.
format article
author Lee Mane-Si Laure
Cholet Julie
Delboulbé Anne
Guillemet Raphaël
Loiseaux Brigitte
Garabedian Patrick
Flügel-Paul Thomas
Benkenstein Tino
Sadlowski Susann
Tetaz Nicolas
Windpassinger Roman
Mahalik Saroj
author_facet Lee Mane-Si Laure
Cholet Julie
Delboulbé Anne
Guillemet Raphaël
Loiseaux Brigitte
Garabedian Patrick
Flügel-Paul Thomas
Benkenstein Tino
Sadlowski Susann
Tetaz Nicolas
Windpassinger Roman
Mahalik Saroj
author_sort Lee Mane-Si Laure
title Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
title_short Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
title_full Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
title_fullStr Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
title_full_unstemmed Wide band UV/Vis/NIR blazed-binary reflective gratings: two lithographic techniques investigation
title_sort wide band uv/vis/nir blazed-binary reflective gratings: two lithographic techniques investigation
publisher EDP Sciences
publishDate 2021
url https://doaj.org/article/4d38697559564c00aca8dc12e358d4eb
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