Lead chalcogenide IR-emitters and detectors on Si-substrates

Narrow gap IV-VI (lead chalcogenide) compounds are employed since long time as mid-IR-detectors and -lasers. IV-VIs are tolerant to structural defects (dislocations). This allows lattice mismatched MBE-growth on foreign substrates like Si which offers significant advantages with respect to size...

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Autores principales: Zogg, H., Arnold, M., Zimin, D., Alchalabi, K.
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Publicado: D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2006
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Acceso en línea:https://doaj.org/article/552e816c5b3e4eca86ea6904a821b3f3
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spelling oai:doaj.org-article:552e816c5b3e4eca86ea6904a821b3f32021-11-21T12:10:26ZLead chalcogenide IR-emitters and detectors on Si-substrates 2537-63651810-648Xhttps://doaj.org/article/552e816c5b3e4eca86ea6904a821b3f32006-01-01T00:00:00Zhttps://mjps.nanotech.md/archive/2006/article/3423https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365Narrow gap IV-VI (lead chalcogenide) compounds are employed since long time as mid-IR-detectors and -lasers. IV-VIs are tolerant to structural defects (dislocations). This allows lattice mismatched MBE-growth on foreign substrates like Si which offers significant advantages with respect to size, costs and thermal conductivities. In addition, IV-VIs are unique as regards design of Bragg mirrors because of the very high index contrast between IV-VI materials (nH = 4-5) and BaF2 (nL=1.43). A few pairs of quarter wavelength nH/nL-stacks suffice to obtain very high reflectivities R>99%. We review some of our results for different devices: Infrared sensor arrays for thermal imaging on active Si read-out chips, RCEDs (resonant cavity enhanced IR detectors), optically pumped PbSe/Pb1-xEuxSe edge emitting DH (double heterostructure) or QW (quantum well) lasers on Si substrates and “wavelength transformers”, VCSEL (vertical cavity surface emitting laser) structures operated in sub-threshold. Zogg, H.Arnold, M.Zimin, D.Alchalabi, K.D.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 5, Iss 1, Pp 88-96 (2006)
institution DOAJ
collection DOAJ
language EN
topic Physics
QC1-999
Electronics
TK7800-8360
spellingShingle Physics
QC1-999
Electronics
TK7800-8360
Zogg, H.
Arnold, M.
Zimin, D.
Alchalabi, K.
Lead chalcogenide IR-emitters and detectors on Si-substrates
description Narrow gap IV-VI (lead chalcogenide) compounds are employed since long time as mid-IR-detectors and -lasers. IV-VIs are tolerant to structural defects (dislocations). This allows lattice mismatched MBE-growth on foreign substrates like Si which offers significant advantages with respect to size, costs and thermal conductivities. In addition, IV-VIs are unique as regards design of Bragg mirrors because of the very high index contrast between IV-VI materials (nH = 4-5) and BaF2 (nL=1.43). A few pairs of quarter wavelength nH/nL-stacks suffice to obtain very high reflectivities R>99%. We review some of our results for different devices: Infrared sensor arrays for thermal imaging on active Si read-out chips, RCEDs (resonant cavity enhanced IR detectors), optically pumped PbSe/Pb1-xEuxSe edge emitting DH (double heterostructure) or QW (quantum well) lasers on Si substrates and “wavelength transformers”, VCSEL (vertical cavity surface emitting laser) structures operated in sub-threshold.
format article
author Zogg, H.
Arnold, M.
Zimin, D.
Alchalabi, K.
author_facet Zogg, H.
Arnold, M.
Zimin, D.
Alchalabi, K.
author_sort Zogg, H.
title Lead chalcogenide IR-emitters and detectors on Si-substrates
title_short Lead chalcogenide IR-emitters and detectors on Si-substrates
title_full Lead chalcogenide IR-emitters and detectors on Si-substrates
title_fullStr Lead chalcogenide IR-emitters and detectors on Si-substrates
title_full_unstemmed Lead chalcogenide IR-emitters and detectors on Si-substrates
title_sort lead chalcogenide ir-emitters and detectors on si-substrates
publisher D.Ghitu Institute of Electronic Engineering and Nanotechnologies
publishDate 2006
url https://doaj.org/article/552e816c5b3e4eca86ea6904a821b3f3
work_keys_str_mv AT zoggh leadchalcogenideiremittersanddetectorsonsisubstrates
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AT zimind leadchalcogenideiremittersanddetectorsonsisubstrates
AT alchalabik leadchalcogenideiremittersanddetectorsonsisubstrates
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