The relation between residual stress, interfacial structure and the joint property in the SiO2f/SiO2-Nb joints

Abstract In order to achieve a high-quality joint between SiO2f/SiO2 and metals, it is necessary to address the poor wettability of SiO2f/SiO2 and the high residual stress in SiO2f/SiO2-Nb joint. Here, we simultaneously realize good wettability and low residual stress in SiO2f/SiO2-Nb joint by combi...

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Autores principales: Qiang Ma, Zhuo Ran Li, Lai Shan Yang, Jing Huang Lin, Jin Ba, Ze Yu Wang, Jun Lei Qi, Ji Cai Feng
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/55adc1259249481fa67b83e9e1879426
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