Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene

The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC do...

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Autores principales: Zhaoli Gao, Sheng Wang, Joel Berry, Qicheng Zhang, Julian Gebhardt, William M. Parkin, Jose Avila, Hemian Yi, Chaoyu Chen, Sebastian Hurtado-Parra, Marija Drndić, Andrew M. Rappe, David J. Srolovitz, James M. Kikkawa, Zhengtang Luo, Maria C. Asensio, Feng Wang, A. T. Charlie Johnson
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Lenguaje:EN
Publicado: Nature Portfolio 2020
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Acceso en línea:https://doaj.org/article/56c581fa05234c709cfe115631e4b2c2
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spelling oai:doaj.org-article:56c581fa05234c709cfe115631e4b2c22021-12-02T14:41:27ZLarge-area epitaxial growth of curvature-stabilized ABC trilayer graphene10.1038/s41467-019-14022-32041-1723https://doaj.org/article/56c581fa05234c709cfe115631e4b2c22020-01-01T00:00:00Zhttps://doi.org/10.1038/s41467-019-14022-3https://doaj.org/toc/2041-1723The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC domains.Zhaoli GaoSheng WangJoel BerryQicheng ZhangJulian GebhardtWilliam M. ParkinJose AvilaHemian YiChaoyu ChenSebastian Hurtado-ParraMarija DrndićAndrew M. RappeDavid J. SrolovitzJames M. KikkawaZhengtang LuoMaria C. AsensioFeng WangA. T. Charlie JohnsonNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-10 (2020)
institution DOAJ
collection DOAJ
language EN
topic Science
Q
spellingShingle Science
Q
Zhaoli Gao
Sheng Wang
Joel Berry
Qicheng Zhang
Julian Gebhardt
William M. Parkin
Jose Avila
Hemian Yi
Chaoyu Chen
Sebastian Hurtado-Parra
Marija Drndić
Andrew M. Rappe
David J. Srolovitz
James M. Kikkawa
Zhengtang Luo
Maria C. Asensio
Feng Wang
A. T. Charlie Johnson
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
description The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC domains.
format article
author Zhaoli Gao
Sheng Wang
Joel Berry
Qicheng Zhang
Julian Gebhardt
William M. Parkin
Jose Avila
Hemian Yi
Chaoyu Chen
Sebastian Hurtado-Parra
Marija Drndić
Andrew M. Rappe
David J. Srolovitz
James M. Kikkawa
Zhengtang Luo
Maria C. Asensio
Feng Wang
A. T. Charlie Johnson
author_facet Zhaoli Gao
Sheng Wang
Joel Berry
Qicheng Zhang
Julian Gebhardt
William M. Parkin
Jose Avila
Hemian Yi
Chaoyu Chen
Sebastian Hurtado-Parra
Marija Drndić
Andrew M. Rappe
David J. Srolovitz
James M. Kikkawa
Zhengtang Luo
Maria C. Asensio
Feng Wang
A. T. Charlie Johnson
author_sort Zhaoli Gao
title Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
title_short Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
title_full Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
title_fullStr Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
title_full_unstemmed Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
title_sort large-area epitaxial growth of curvature-stabilized abc trilayer graphene
publisher Nature Portfolio
publishDate 2020
url https://doaj.org/article/56c581fa05234c709cfe115631e4b2c2
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