Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene
The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC do...
Guardado en:
Autores principales: | , , , , , , , , , , , , , , , , , |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2020
|
Materias: | |
Acceso en línea: | https://doaj.org/article/56c581fa05234c709cfe115631e4b2c2 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
id |
oai:doaj.org-article:56c581fa05234c709cfe115631e4b2c2 |
---|---|
record_format |
dspace |
spelling |
oai:doaj.org-article:56c581fa05234c709cfe115631e4b2c22021-12-02T14:41:27ZLarge-area epitaxial growth of curvature-stabilized ABC trilayer graphene10.1038/s41467-019-14022-32041-1723https://doaj.org/article/56c581fa05234c709cfe115631e4b2c22020-01-01T00:00:00Zhttps://doi.org/10.1038/s41467-019-14022-3https://doaj.org/toc/2041-1723The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC domains.Zhaoli GaoSheng WangJoel BerryQicheng ZhangJulian GebhardtWilliam M. ParkinJose AvilaHemian YiChaoyu ChenSebastian Hurtado-ParraMarija DrndićAndrew M. RappeDavid J. SrolovitzJames M. KikkawaZhengtang LuoMaria C. AsensioFeng WangA. T. Charlie JohnsonNature PortfolioarticleScienceQENNature Communications, Vol 11, Iss 1, Pp 1-10 (2020) |
institution |
DOAJ |
collection |
DOAJ |
language |
EN |
topic |
Science Q |
spellingShingle |
Science Q Zhaoli Gao Sheng Wang Joel Berry Qicheng Zhang Julian Gebhardt William M. Parkin Jose Avila Hemian Yi Chaoyu Chen Sebastian Hurtado-Parra Marija Drndić Andrew M. Rappe David J. Srolovitz James M. Kikkawa Zhengtang Luo Maria C. Asensio Feng Wang A. T. Charlie Johnson Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
description |
The semiconducting ABC configuration of trilayer graphene is more challenging to grow on large scales than its semimetallic ABA counterpart. Here, an approach to trilayer growth via chemical vapor deposition is presented that utilizes substrate curvature to yield enhanced fraction and size of ABC domains. |
format |
article |
author |
Zhaoli Gao Sheng Wang Joel Berry Qicheng Zhang Julian Gebhardt William M. Parkin Jose Avila Hemian Yi Chaoyu Chen Sebastian Hurtado-Parra Marija Drndić Andrew M. Rappe David J. Srolovitz James M. Kikkawa Zhengtang Luo Maria C. Asensio Feng Wang A. T. Charlie Johnson |
author_facet |
Zhaoli Gao Sheng Wang Joel Berry Qicheng Zhang Julian Gebhardt William M. Parkin Jose Avila Hemian Yi Chaoyu Chen Sebastian Hurtado-Parra Marija Drndić Andrew M. Rappe David J. Srolovitz James M. Kikkawa Zhengtang Luo Maria C. Asensio Feng Wang A. T. Charlie Johnson |
author_sort |
Zhaoli Gao |
title |
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
title_short |
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
title_full |
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
title_fullStr |
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
title_full_unstemmed |
Large-area epitaxial growth of curvature-stabilized ABC trilayer graphene |
title_sort |
large-area epitaxial growth of curvature-stabilized abc trilayer graphene |
publisher |
Nature Portfolio |
publishDate |
2020 |
url |
https://doaj.org/article/56c581fa05234c709cfe115631e4b2c2 |
work_keys_str_mv |
AT zhaoligao largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT shengwang largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT joelberry largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT qichengzhang largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT juliangebhardt largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT williammparkin largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT joseavila largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT hemianyi largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT chaoyuchen largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT sebastianhurtadoparra largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT marijadrndic largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT andrewmrappe largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT davidjsrolovitz largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT jamesmkikkawa largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT zhengtangluo largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT mariacasensio largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT fengwang largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene AT atcharliejohnson largeareaepitaxialgrowthofcurvaturestabilizedabctrilayergraphene |
_version_ |
1718389870119878656 |