Zirconium Oxide Thin Films Obtained by Atomic Layer Deposition Technology Abolish the Anti-Osteogenic Effect Resulting from miR-21 Inhibition in the Pre-Osteoblastic MC3T3 Cell Line

Zirconium Oxide Thin Films Obtained by Atomic Layer Deposition Technology Abolish the Anti-Osteogenic Effect Resulting from miR-21 Inhibition in the Pre-Osteoblastic MC3T3 Cell Line

Aleksandra Seweryn,1 Ariadna Pielok,2 Krystyna Lawniczak-Jablonska,1 Rafal Pietruszka,1 Klaudia Marcinkowska,2 Mateusz Sikora,2 Bartlomiej S Witkowski,1 Marek Godlewski,1 Krzysztof Marycz,2,3 Agnieszka Smieszek2 1Institute of Physics, Polish Academy of Sciences, Warsaw PL-02668, Poland; 2Wroclaw Uni...

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Detalles Bibliográficos
Autores principales: Seweryn A, Pielok A, Lawniczak-Jablonska K, Pietruszka R, Marcinkowska K, Sikora M, Witkowski BS, Godlewski M, Marycz K, Smieszek A
Formato: article
Lenguaje:EN
Publicado: Dove Medical Press 2020
Materias:
ald
zirconia-based coatings
pro-osteogenic properties
cytocompatibility
osteoblasts precursors
Medicine (General)
R5-920
Acceso en línea:https://doaj.org/article/6036952cd8274789b0f986d209809886
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https://doaj.org/article/6036952cd8274789b0f986d209809886

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