In situ atomistic observation of disconnection-mediated grain boundary migration

Shear-induced grain boundary migration at the atomic level is still not well understood. Here the authors combine in situ shear testing experiments and molecular dynamic simulations to reveal the atomistic mechanism of disconnection-mediated GB migration in different gold nanostructures.

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Autores principales: Qi Zhu, Guang Cao, Jiangwei Wang, Chuang Deng, Jixue Li, Ze Zhang, Scott X. Mao
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2019
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Q
Acceso en línea:https://doaj.org/article/617383e8feef4570a0db5982bd0a7df6
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