In situ atomistic observation of disconnection-mediated grain boundary migration
Shear-induced grain boundary migration at the atomic level is still not well understood. Here the authors combine in situ shear testing experiments and molecular dynamic simulations to reveal the atomistic mechanism of disconnection-mediated GB migration in different gold nanostructures.
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Autores principales: | Qi Zhu, Guang Cao, Jiangwei Wang, Chuang Deng, Jixue Li, Ze Zhang, Scott X. Mao |
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Formato: | article |
Lenguaje: | EN |
Publicado: |
Nature Portfolio
2019
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Materias: | |
Acceso en línea: | https://doaj.org/article/617383e8feef4570a0db5982bd0a7df6 |
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