In situ atomistic observation of disconnection-mediated grain boundary migration

Shear-induced grain boundary migration at the atomic level is still not well understood. Here the authors combine in situ shear testing experiments and molecular dynamic simulations to reveal the atomistic mechanism of disconnection-mediated GB migration in different gold nanostructures.

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Auteurs principaux: Qi Zhu, Guang Cao, Jiangwei Wang, Chuang Deng, Jixue Li, Ze Zhang, Scott X. Mao
Format: article
Langue:EN
Publié: Nature Portfolio 2019
Sujets:
Q
Accès en ligne:https://doaj.org/article/617383e8feef4570a0db5982bd0a7df6
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