Enhancing silicide formation in Ni/Si(111) by Ag-Si particles at the interface

Abstract Compound formation at a metal/semiconductor interface plays crucial roles in the properties of many material systems. Applications of Ni silicides span numerous areas and have the potential to be used as new functionalities. However, the magnetic properties of ultrathin Ni layers on silicon...

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Autores principales: Cheng-Hsun-Tony Chang, Pei-Cheng Jiang, Yu-Ting Chow, Hsi-Lien Hsiao, Wei-Bin Su, Jyh-Shen Tsay
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2019
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Acceso en línea:https://doaj.org/article/6416484f4059496db4dda234f6cd3da8
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