Anisotropic etching of graphite and graphene in a remote hydrogen plasma
Nanofabrication: remote etching of graphene on hBN is highly anisotropic Etching of graphite with hydrogen plasma gives rise to two distinct etching regimes, governed by the degree of direct plasma exposure. A team led by D. M. Zumbühl at the University of Basel investigated the interplay between gr...
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| Auteurs principaux: | , , , , , , , , |
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| Format: | article |
| Langue: | EN |
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Nature Portfolio
2017
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| Accès en ligne: | https://doaj.org/article/6716f4d3bc44416793f3e688bdacf5f5 |
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