UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper

Hyperspectral imaging and reflectance spectroscopy in the range from 200–380 nm were used to rapidly detect and characterize copper oxidation states and their layer thicknesses on direct bonded copper in a non-destructive way. Single-point UV reflectance spectroscopy, as a well-established method, w...

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Autores principales: Mohammad Al Ktash, Mona Stefanakis, Tim Englert, Maryam S. L. Drechsel, Jan Stiedl, Simon Green, Timo Jacob, Barbara Boldrini, Edwin Ostertag, Karsten Rebner, Marc Brecht
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Publicado: MDPI AG 2021
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spelling oai:doaj.org-article:6a85092827184b35ae9c7c442f628be92021-11-11T19:16:44ZUV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper10.3390/s212173321424-8220https://doaj.org/article/6a85092827184b35ae9c7c442f628be92021-11-01T00:00:00Zhttps://www.mdpi.com/1424-8220/21/21/7332https://doaj.org/toc/1424-8220Hyperspectral imaging and reflectance spectroscopy in the range from 200–380 nm were used to rapidly detect and characterize copper oxidation states and their layer thicknesses on direct bonded copper in a non-destructive way. Single-point UV reflectance spectroscopy, as a well-established method, was utilized to compare the quality of the hyperspectral imaging results. For the laterally resolved measurements of the copper surfaces an UV hyperspectral imaging setup based on a pushbroom imager was used. Six different types of direct bonded copper were studied. Each type had a different oxide layer thickness and was analyzed by depth profiling using X-ray photoelectron spectroscopy. In total, 28 samples were measured to develop multivariate models to characterize and predict the oxide layer thicknesses. The principal component analysis models (PCA) enabled a general differentiation between the sample types on the first two PCs with 100.0% and 96% explained variance for UV spectroscopy and hyperspectral imaging, respectively. Partial least squares regression (PLS-R) models showed reliable performance with <i>R</i><sup>2</sup><sub>c</sub> = 0.94 and 0.94 and RMSEC = 1.64 nm and 1.76 nm, respectively. The developed in-line prototype system combined with multivariate data modeling shows high potential for further development of this technique towards real large-scale processes.Mohammad Al KtashMona StefanakisTim EnglertMaryam S. L. DrechselJan StiedlSimon GreenTimo JacobBarbara BoldriniEdwin OstertagKarsten RebnerMarc BrechtMDPI AGarticlehyperspectral imagingpushbroomUV spectroscopyprincipal component analysispartial least squares regressiondirect bonded copperChemical technologyTP1-1185ENSensors, Vol 21, Iss 7332, p 7332 (2021)
institution DOAJ
collection DOAJ
language EN
topic hyperspectral imaging
pushbroom
UV spectroscopy
principal component analysis
partial least squares regression
direct bonded copper
Chemical technology
TP1-1185
spellingShingle hyperspectral imaging
pushbroom
UV spectroscopy
principal component analysis
partial least squares regression
direct bonded copper
Chemical technology
TP1-1185
Mohammad Al Ktash
Mona Stefanakis
Tim Englert
Maryam S. L. Drechsel
Jan Stiedl
Simon Green
Timo Jacob
Barbara Boldrini
Edwin Ostertag
Karsten Rebner
Marc Brecht
UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
description Hyperspectral imaging and reflectance spectroscopy in the range from 200–380 nm were used to rapidly detect and characterize copper oxidation states and their layer thicknesses on direct bonded copper in a non-destructive way. Single-point UV reflectance spectroscopy, as a well-established method, was utilized to compare the quality of the hyperspectral imaging results. For the laterally resolved measurements of the copper surfaces an UV hyperspectral imaging setup based on a pushbroom imager was used. Six different types of direct bonded copper were studied. Each type had a different oxide layer thickness and was analyzed by depth profiling using X-ray photoelectron spectroscopy. In total, 28 samples were measured to develop multivariate models to characterize and predict the oxide layer thicknesses. The principal component analysis models (PCA) enabled a general differentiation between the sample types on the first two PCs with 100.0% and 96% explained variance for UV spectroscopy and hyperspectral imaging, respectively. Partial least squares regression (PLS-R) models showed reliable performance with <i>R</i><sup>2</sup><sub>c</sub> = 0.94 and 0.94 and RMSEC = 1.64 nm and 1.76 nm, respectively. The developed in-line prototype system combined with multivariate data modeling shows high potential for further development of this technique towards real large-scale processes.
format article
author Mohammad Al Ktash
Mona Stefanakis
Tim Englert
Maryam S. L. Drechsel
Jan Stiedl
Simon Green
Timo Jacob
Barbara Boldrini
Edwin Ostertag
Karsten Rebner
Marc Brecht
author_facet Mohammad Al Ktash
Mona Stefanakis
Tim Englert
Maryam S. L. Drechsel
Jan Stiedl
Simon Green
Timo Jacob
Barbara Boldrini
Edwin Ostertag
Karsten Rebner
Marc Brecht
author_sort Mohammad Al Ktash
title UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
title_short UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
title_full UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
title_fullStr UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
title_full_unstemmed UV Hyperspectral Imaging as Process Analytical Tool for the Characterization of Oxide Layers and Copper States on Direct Bonded Copper
title_sort uv hyperspectral imaging as process analytical tool for the characterization of oxide layers and copper states on direct bonded copper
publisher MDPI AG
publishDate 2021
url https://doaj.org/article/6a85092827184b35ae9c7c442f628be9
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