Strain effects on polycrystalline germanium thin films

Abstract Polycrystalline Ge thin films have attracted increasing attention because their hole mobilities exceed those of single-crystal Si wafers, while the process temperature is low. In this study, we investigate the strain effects on the crystal and electrical properties of polycrystalline Ge lay...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Toshifumi Imajo, Takashi Suemasu, Kaoru Toko
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
R
Q
Acceso en línea:https://doaj.org/article/6be6c68941b4463b80afec4cd4a2e62f
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!