The ZnO-In<sub>2</sub>O<sub>3</sub> Oxide System as a Material for Low-Temperature Deposition of Transparent Electrodes

The ZnO-In<sub>2</sub>O<sub>3</sub> Oxide System as a Material for Low-Temperature Deposition of Transparent Electrodes

The development of optoelectronic devices based on flexible organic substrates substantially decreases the possible process temperatures during all stages of device manufacturing. This makes it urgent to search for new transparent conducting oxide (TCO) materials, cheaper than traditional indium-tin...

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Autores principales: Akhmed Akhmedov, Aslan Abduev, Eldar Murliev, Abil Asvarov, Arsen Muslimov, Vladimir Kanevsky
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
transparent conductive oxide (TCO)
ZnO
In<sub>2</sub>O<sub>3</sub>
spark plasma sintering (SPS)
magnetron sputtering
ceramic target
Technology
T
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Engineering (General). Civil engineering (General)
TA1-2040
Microscopy
QH201-278.5
Descriptive and experimental mechanics
QC120-168.85
Acceso en línea:https://doaj.org/article/6d56cc3c504546c695985081286ebb07
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https://doaj.org/article/6d56cc3c504546c695985081286ebb07

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