High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

For widespread technological application of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, the authors present a CMOS fabrication technique that realizes integrate photonic microresonators on waver-level with mean quality factors e...

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Autores principales:	Junqiu Liu, Guanhao Huang, Rui Ning Wang, Jijun He, Arslan S. Raja, Tianyi Liu, Nils J. Engelsen, Tobias J. Kippenberg
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2021
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/6fe1bcd7c04b4aeebc420019f947e345
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spelling	oai:doaj.org-article:6fe1bcd7c04b4aeebc420019f947e3452021-12-02T14:25:17ZHigh-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits10.1038/s41467-021-21973-z2041-1723https://doaj.org/article/6fe1bcd7c04b4aeebc420019f947e3452021-04-01T00:00:00Zhttps://doi.org/10.1038/s41467-021-21973-zhttps://doaj.org/toc/2041-1723For widespread technological application of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, the authors present a CMOS fabrication technique that realizes integrate photonic microresonators on waver-level with mean quality factors exceeding 30 million and 1 dB/m optical losses.Junqiu LiuGuanhao HuangRui Ning WangJijun HeArslan S. RajaTianyi LiuNils J. EngelsenTobias J. KippenbergNature PortfolioarticleScienceQENNature Communications, Vol 12, Iss 1, Pp 1-9 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Junqiu Liu Guanhao Huang Rui Ning Wang Jijun He Arslan S. Raja Tianyi Liu Nils J. Engelsen Tobias J. Kippenberg High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
description	For widespread technological application of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, the authors present a CMOS fabrication technique that realizes integrate photonic microresonators on waver-level with mean quality factors exceeding 30 million and 1 dB/m optical losses.
format	article
author	Junqiu Liu Guanhao Huang Rui Ning Wang Jijun He Arslan S. Raja Tianyi Liu Nils J. Engelsen Tobias J. Kippenberg
author_facet	Junqiu Liu Guanhao Huang Rui Ning Wang Jijun He Arslan S. Raja Tianyi Liu Nils J. Engelsen Tobias J. Kippenberg
author_sort	Junqiu Liu
title	High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
title_short	High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
title_full	High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
title_fullStr	High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
title_full_unstemmed	High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
title_sort	high-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits
publisher	Nature Portfolio
publishDate	2021
url	https://doaj.org/article/6fe1bcd7c04b4aeebc420019f947e345
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High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

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