Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}

Understanding the unique properties of ultra-wide band gap semiconductors requires detailed information about the exact nature of point defects and their role in determining the properties. Here, we report the first direct microscopic observation of an unusual formation of point defect complexes wit...

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Autores principales: Jared M. Johnson, Zhen Chen, Joel B. Varley, Christine M. Jackson, Esmat Farzana, Zeng Zhang, Aaron R. Arehart, Hsien-Lien Huang, Arda Genc, Steven A. Ringel, Chris G. Van de Walle, David A. Muller, Jinwoo Hwang
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Publicado: American Physical Society 2019
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spelling oai:doaj.org-article:753ff00c08774f66ab627758de659be32021-12-02T12:02:05ZUnusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}10.1103/PhysRevX.9.0410272160-3308https://doaj.org/article/753ff00c08774f66ab627758de659be32019-11-01T00:00:00Zhttp://doi.org/10.1103/PhysRevX.9.041027http://doi.org/10.1103/PhysRevX.9.041027https://doaj.org/toc/2160-3308Understanding the unique properties of ultra-wide band gap semiconductors requires detailed information about the exact nature of point defects and their role in determining the properties. Here, we report the first direct microscopic observation of an unusual formation of point defect complexes within the atomic-scale structure of β-Ga_{2}O_{3} using high resolution scanning transmission electron microscopy (STEM). Each complex involves one cation interstitial atom paired with two cation vacancies. These divacancy-interstitial complexes correlate directly with structures obtained by density functional theory, which predicts them to be compensating acceptors in β-Ga_{2}O_{3}. This prediction is confirmed by a comparison between STEM data and deep level optical spectroscopy results, which reveals that these complexes correspond to a deep trap within the band gap, and that the development of the complexes is facilitated by Sn doping through increased vacancy concentration. These findings provide new insight on this emerging material’s unique response to the incorporation of impurities that can critically influence their properties.Jared M. JohnsonZhen ChenJoel B. VarleyChristine M. JacksonEsmat FarzanaZeng ZhangAaron R. ArehartHsien-Lien HuangArda GencSteven A. RingelChris G. Van de WalleDavid A. MullerJinwoo HwangAmerican Physical SocietyarticlePhysicsQC1-999ENPhysical Review X, Vol 9, Iss 4, p 041027 (2019)
institution DOAJ
collection DOAJ
language EN
topic Physics
QC1-999
spellingShingle Physics
QC1-999
Jared M. Johnson
Zhen Chen
Joel B. Varley
Christine M. Jackson
Esmat Farzana
Zeng Zhang
Aaron R. Arehart
Hsien-Lien Huang
Arda Genc
Steven A. Ringel
Chris G. Van de Walle
David A. Muller
Jinwoo Hwang
Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
description Understanding the unique properties of ultra-wide band gap semiconductors requires detailed information about the exact nature of point defects and their role in determining the properties. Here, we report the first direct microscopic observation of an unusual formation of point defect complexes within the atomic-scale structure of β-Ga_{2}O_{3} using high resolution scanning transmission electron microscopy (STEM). Each complex involves one cation interstitial atom paired with two cation vacancies. These divacancy-interstitial complexes correlate directly with structures obtained by density functional theory, which predicts them to be compensating acceptors in β-Ga_{2}O_{3}. This prediction is confirmed by a comparison between STEM data and deep level optical spectroscopy results, which reveals that these complexes correspond to a deep trap within the band gap, and that the development of the complexes is facilitated by Sn doping through increased vacancy concentration. These findings provide new insight on this emerging material’s unique response to the incorporation of impurities that can critically influence their properties.
format article
author Jared M. Johnson
Zhen Chen
Joel B. Varley
Christine M. Jackson
Esmat Farzana
Zeng Zhang
Aaron R. Arehart
Hsien-Lien Huang
Arda Genc
Steven A. Ringel
Chris G. Van de Walle
David A. Muller
Jinwoo Hwang
author_facet Jared M. Johnson
Zhen Chen
Joel B. Varley
Christine M. Jackson
Esmat Farzana
Zeng Zhang
Aaron R. Arehart
Hsien-Lien Huang
Arda Genc
Steven A. Ringel
Chris G. Van de Walle
David A. Muller
Jinwoo Hwang
author_sort Jared M. Johnson
title Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
title_short Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
title_full Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
title_fullStr Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
title_full_unstemmed Unusual Formation of Point-Defect Complexes in the Ultrawide-Band-Gap Semiconductor β-Ga_{2}O_{3}
title_sort unusual formation of point-defect complexes in the ultrawide-band-gap semiconductor β-ga_{2}o_{3}
publisher American Physical Society
publishDate 2019
url https://doaj.org/article/753ff00c08774f66ab627758de659be3
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