Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films

To enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequen...

Descripción completa

Guardado en:

Detalles Bibliográficos
Autores principales:	Bärtschi Manuel, Schachtler Daniel, Schwyn-Thöny Silvia, Südmeyer Thomas, Botha Roelene
Formato:	article
Lenguaje:	EN
Publicado:	EDP Sciences 2021
Materias:	Physics QC1-999
Acceso en línea:	https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad37
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

id	oai:doaj.org-article:7628a529ba534d1b9e2ff13e8c6aad37
record_format	dspace
spelling	oai:doaj.org-article:7628a529ba534d1b9e2ff13e8c6aad372021-12-02T17:12:51ZInvestigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films2100-014X10.1051/epjconf/202125503005https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad372021-01-01T00:00:00Zhttps://www.epj-conferences.org/articles/epjconf/pdf/2021/09/epjconf_eosam2021_03005.pdfhttps://doaj.org/toc/2100-014XTo enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequently essential. This study investigated the influence of the plasma source power on the optical properties, layer uniformity and stress, scattered light behavior and optical losses of magnetron sputtered Ta2O5 thin films.Bärtschi ManuelSchachtler DanielSchwyn-Thöny SilviaSüdmeyer ThomasBotha RoeleneEDP SciencesarticlePhysicsQC1-999ENEPJ Web of Conferences, Vol 255, p 03005 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Physics QC1-999
spellingShingle	Physics QC1-999 Bärtschi Manuel Schachtler Daniel Schwyn-Thöny Silvia Südmeyer Thomas Botha Roelene Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
description	To enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequently essential. This study investigated the influence of the plasma source power on the optical properties, layer uniformity and stress, scattered light behavior and optical losses of magnetron sputtered Ta2O5 thin films.
format	article
author	Bärtschi Manuel Schachtler Daniel Schwyn-Thöny Silvia Südmeyer Thomas Botha Roelene
author_facet	Bärtschi Manuel Schachtler Daniel Schwyn-Thöny Silvia Südmeyer Thomas Botha Roelene
author_sort	Bärtschi Manuel
title	Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
title_short	Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
title_full	Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
title_fullStr	Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
title_full_unstemmed	Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
title_sort	investigation of the influence of plasma source power on the properties of magnetron sputtered ta2o5 thin films
publisher	EDP Sciences
publishDate	2021
url	https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad37
work_keys_str_mv	AT bartschimanuel investigationoftheinfluenceofplasmasourcepoweronthepropertiesofmagnetronsputteredta2o5thinfilms AT schachtlerdaniel investigationoftheinfluenceofplasmasourcepoweronthepropertiesofmagnetronsputteredta2o5thinfilms AT schwynthonysilvia investigationoftheinfluenceofplasmasourcepoweronthepropertiesofmagnetronsputteredta2o5thinfilms AT sudmeyerthomas investigationoftheinfluenceofplasmasourcepoweronthepropertiesofmagnetronsputteredta2o5thinfilms AT botharoelene investigationoftheinfluenceofplasmasourcepoweronthepropertiesofmagnetronsputteredta2o5thinfilms
_version_	1718381385561931776

Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films

Ejemplares similares