Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films
To enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequen...
Enregistré dans:
| Auteurs principaux: | , , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
EDP Sciences
2021
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad37 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Soyez le premier à ajouter un commentaire!