APA (7th ed.) Citation

Wang, C., Chen, Y., Hsu, H., Tsao, Y., Lin, Y., Dee, C., & Chang, E. (2021). Adoption of the Wet Surface Treatment Technique for the Improvement of Device Performance of Enhancement-Mode AlGaN/GaN MOSHEMTs for Millimeter-Wave Applications. MDPI AG.

Chicago Style (17th ed.) Citation

Wang, Chun, Yu-Chiao Chen, Heng-Tung Hsu, Yi-Fan Tsao, Yueh-Chin Lin, Chang-Fu Dee, and Edward-Yi Chang. Adoption of the Wet Surface Treatment Technique for the Improvement of Device Performance of Enhancement-Mode AlGaN/GaN MOSHEMTs for Millimeter-Wave Applications. MDPI AG, 2021.

MLA (8th ed.) Citation

Wang, Chun, et al. Adoption of the Wet Surface Treatment Technique for the Improvement of Device Performance of Enhancement-Mode AlGaN/GaN MOSHEMTs for Millimeter-Wave Applications. MDPI AG, 2021.