Simulation studies on electrical characteristics of silicon nanowire feedback field-effect transistors with interface trap charges

Abstract In this study, we examine the electrical characteristics of silicon nanowire feedback field-effect transistors (FBFETs) with interface trap charges between the channel and gate oxide. The band diagram, I–V characteristics, memory window, and operation were analyzed using a commercial techno...

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Autores principales: Yejin Yang, Young-Soo Park, Jaemin Son, Kyoungah Cho, Sangsig Kim
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
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Acceso en línea:https://doaj.org/article/80e09c838d104eb6b50c1c1939b2590e
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