Simulation studies on electrical characteristics of silicon nanowire feedback field-effect transistors with interface trap charges

Abstract In this study, we examine the electrical characteristics of silicon nanowire feedback field-effect transistors (FBFETs) with interface trap charges between the channel and gate oxide. The band diagram, I–V characteristics, memory window, and operation were analyzed using a commercial techno...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Yejin Yang, Young-Soo Park, Jaemin Son, Kyoungah Cho, Sangsig Kim
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2021
Materias:
R
Q
Acceso en línea:https://doaj.org/article/80e09c838d104eb6b50c1c1939b2590e
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Ejemplares similares