Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics
Insulating materials combining a high mechanical stability, a low dielectric constant and the ability to completely fill narrow gaps are essential to fabricate interconnects for future high-performance chips. Here, the authors integrate zeolitic imidazolate frameworks as ultra-low-k dielectrics with...
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| Main Authors: | , , , , , , , , |
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| Format: | article |
| Language: | EN |
| Published: |
Nature Portfolio
2019
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| Subjects: | |
| Online Access: | https://doaj.org/article/87c3378f4c7b4710a082cda83ed8d0cb |
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