New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates
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D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2006
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oai:doaj.org-article:87e47038853e4cfbbae0b9b22254decf2021-11-21T12:10:33ZNew technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates2537-63651810-648Xhttps://doaj.org/article/87e47038853e4cfbbae0b9b22254decf2006-01-01T00:00:00Zhttps://mjps.nanotech.md/archive/2006/article/3425https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365 Nikolskii, Iu.Grigorova, V.Ziuzin, S.Kot, I.Pleşakova, L.D.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 5, Iss 1, Pp 99-102 (2006) |
| institution |
DOAJ |
| collection |
DOAJ |
| language |
EN |
| topic |
Physics QC1-999 Electronics TK7800-8360 |
| spellingShingle |
Physics QC1-999 Electronics TK7800-8360 Nikolskii, Iu. Grigorova, V. Ziuzin, S. Kot, I. Pleşakova, L. New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| description |
|
| format |
article |
| author |
Nikolskii, Iu. Grigorova, V. Ziuzin, S. Kot, I. Pleşakova, L. |
| author_facet |
Nikolskii, Iu. Grigorova, V. Ziuzin, S. Kot, I. Pleşakova, L. |
| author_sort |
Nikolskii, Iu. |
| title |
New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| title_short |
New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| title_full |
New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| title_fullStr |
New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| title_full_unstemmed |
New technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| title_sort |
new technology of preparation of indium antimonide thin films onto dielectrical substrates and onto oxide silicon substrates |
| publisher |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies |
| publishDate |
2006 |
| url |
https://doaj.org/article/87e47038853e4cfbbae0b9b22254decf |
| work_keys_str_mv |
AT nikolskiiiu newtechnologyofpreparationofindiumantimonidethinfilmsontodielectricalsubstratesandontooxidesiliconsubstrates AT grigorovav newtechnologyofpreparationofindiumantimonidethinfilmsontodielectricalsubstratesandontooxidesiliconsubstrates AT ziuzins newtechnologyofpreparationofindiumantimonidethinfilmsontodielectricalsubstratesandontooxidesiliconsubstrates AT koti newtechnologyofpreparationofindiumantimonidethinfilmsontodielectricalsubstratesandontooxidesiliconsubstrates AT plesakoval newtechnologyofpreparationofindiumantimonidethinfilmsontodielectricalsubstratesandontooxidesiliconsubstrates |
| _version_ |
1718419134805442560 |