Indentation size effect in ITO/Si planar structure under concentrated load action
For studying strength properties of planar structures ITO (In2O3·SnO2)/Si the technique of Vickers pyramid microindentation for the load range of 0.2-1.5 N was applied. Measure- ments of microhardness of these structures have shown results varying over a wide range in dependence on film thicknes...
Guardado en:
Autor principal: | |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2007
|
Materias: | |
Acceso en línea: | https://doaj.org/article/8a4a2b1cc03248d4ac22292f48800b1c |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|