Indentation size effect in ITO/Si planar structure under concentrated load action
For studying strength properties of planar structures ITO (In2O3·SnO2)/Si the technique of Vickers pyramid microindentation for the load range of 0.2-1.5 N was applied. Measure- ments of microhardness of these structures have shown results varying over a wide range in dependence on film thicknes...
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| Format: | article |
| Langue: | EN |
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D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2007
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| Accès en ligne: | https://doaj.org/article/8a4a2b1cc03248d4ac22292f48800b1c |
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