Annealing Studies of Copper Indium Oxide (Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>) Thin Films Prepared by RF Magnetron Sputtering
Copper indium oxide (Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>) thin films were deposited by the RF magnetron sputtering technique using a Cu<sub>2</sub>O:In<sub>2</sub>O<sub>3</sub> target. The films were deposited on glass and...
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| Auteurs principaux: | , , , |
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| Format: | article |
| Langue: | EN |
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MDPI AG
2021
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| Accès en ligne: | https://doaj.org/article/8de0c8eb5ee8471fa6b48f02c8cb33c0 |
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