Annealing Studies of Copper Indium Oxide (Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>) Thin Films Prepared by RF Magnetron Sputtering

Annealing Studies of Copper Indium Oxide (Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>) Thin Films Prepared by RF Magnetron Sputtering

Copper indium oxide (Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>) thin films were deposited by the RF magnetron sputtering technique using a Cu<sub>2</sub>O:In<sub>2</sub>O<sub>3</sub> target. The films were deposited on glass and...

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Autores principales: Giji Skaria, Ashwin Kumar Saikumar, Akshaya D. Shivprasad, Kalpathy B. Sundaram
Formato: article
Lenguaje:EN
Publicado: MDPI AG 2021
Materias:
Cu<sub>2</sub>In<sub>2</sub>O<sub>5</sub>
RF sputtering
annealing studies
optical characteristics
XRD
morphology studies
Engineering (General). Civil engineering (General)
TA1-2040
Acceso en línea:https://doaj.org/article/8de0c8eb5ee8471fa6b48f02c8cb33c0
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