Scattering mechanisms of charge carriers in gallium antimonide doped with iron

Obtaining, homogenizing, and purifying technologic conditions for gallium antimonide doped with iron and simultaneously doped with iron and tellurium are described. According to the research of galvanometric features of nondoped gallium antimonide and gallium antimonide doped with 3 at % iron con...

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Autores principales: Gheorghiţă, Eugen, Guţuleac, Leonid, Melinte, Victoria, Zlotea, Olga, Postolachi, Igor
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Publicado: D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2008
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spelling oai:doaj.org-article:93447c4b3d6840d1a48eca025a20d70c2021-11-21T12:06:50ZScattering mechanisms of charge carriers in gallium antimonide doped with iron2537-63651810-648Xhttps://doaj.org/article/93447c4b3d6840d1a48eca025a20d70c2008-07-01T00:00:00Zhttps://mjps.nanotech.md/archive/2008/article/3922https://doaj.org/toc/1810-648Xhttps://doaj.org/toc/2537-6365Obtaining, homogenizing, and purifying technologic conditions for gallium antimonide doped with iron and simultaneously doped with iron and tellurium are described. According to the research of galvanometric features of nondoped gallium antimonide and gallium antimonide doped with 3 at % iron concentration for the temperature range of 4.2÷300 K, the mechanisms of charge carrier scattering are analyzed. It is demonstrated that for explanation of experimental data obtained for the U = U(T) function it is necessary to involve an additional mechanism of charge carrier scattering specific to the inclusions formed in gallium antimonide – clusters. Using the physical conceptions of this mechanism, the basic characteristics of scattering of the charge carriers determined by clusters are determined. Gheorghiţă, EugenGuţuleac, LeonidMelinte, VictoriaZlotea, OlgaPostolachi, IgorD.Ghitu Institute of Electronic Engineering and NanotechnologiesarticlePhysicsQC1-999ElectronicsTK7800-8360ENMoldavian Journal of the Physical Sciences, Vol 7, Iss 3, Pp 375-381 (2008)
institution DOAJ
collection DOAJ
language EN
topic Physics
QC1-999
Electronics
TK7800-8360
spellingShingle Physics
QC1-999
Electronics
TK7800-8360
Gheorghiţă, Eugen
Guţuleac, Leonid
Melinte, Victoria
Zlotea, Olga
Postolachi, Igor
Scattering mechanisms of charge carriers in gallium antimonide doped with iron
description Obtaining, homogenizing, and purifying technologic conditions for gallium antimonide doped with iron and simultaneously doped with iron and tellurium are described. According to the research of galvanometric features of nondoped gallium antimonide and gallium antimonide doped with 3 at % iron concentration for the temperature range of 4.2÷300 K, the mechanisms of charge carrier scattering are analyzed. It is demonstrated that for explanation of experimental data obtained for the U = U(T) function it is necessary to involve an additional mechanism of charge carrier scattering specific to the inclusions formed in gallium antimonide – clusters. Using the physical conceptions of this mechanism, the basic characteristics of scattering of the charge carriers determined by clusters are determined.
format article
author Gheorghiţă, Eugen
Guţuleac, Leonid
Melinte, Victoria
Zlotea, Olga
Postolachi, Igor
author_facet Gheorghiţă, Eugen
Guţuleac, Leonid
Melinte, Victoria
Zlotea, Olga
Postolachi, Igor
author_sort Gheorghiţă, Eugen
title Scattering mechanisms of charge carriers in gallium antimonide doped with iron
title_short Scattering mechanisms of charge carriers in gallium antimonide doped with iron
title_full Scattering mechanisms of charge carriers in gallium antimonide doped with iron
title_fullStr Scattering mechanisms of charge carriers in gallium antimonide doped with iron
title_full_unstemmed Scattering mechanisms of charge carriers in gallium antimonide doped with iron
title_sort scattering mechanisms of charge carriers in gallium antimonide doped with iron
publisher D.Ghitu Institute of Electronic Engineering and Nanotechnologies
publishDate 2008
url https://doaj.org/article/93447c4b3d6840d1a48eca025a20d70c
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