Enhancement of laser ablation via interacting spatial double-pulse effect

A novel spatial double-pulse laser ablation scheme is investigated to enhance the processing quality and efficiency for nanosecond laser ablation of silicon substrate. During the double-pulse laser ablation, two splitted laser beams simultaneously irradiate on silicon surface at a tunable gap. The a...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autores principales: Zhou Rui, Lin Shengdong, Ding Ye, Yang Huan, Yong Keng Kenny Ong, Hong Minghui
Formato: article
Lenguaje:EN
Publicado: Institue of Optics and Electronics, Chinese Academy of Sciences 2018
Materias:
Acceso en línea:https://doaj.org/article/9921e474b7ea4b3485e76da5ea607e16
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!