On the influence of interface charging dynamics and stressing conditions in strained silicon devices
Abstract The performance of strained silicon devices based on the deposition of a top silicon nitride layer with high stress have been thoroughly analyzed by means of simulations and experimental results. Results clearly indicate that the electro-optic static response is basically governed by carrie...
Enregistré dans:
Auteurs principaux: | , , |
---|---|
Format: | article |
Langue: | EN |
Publié: |
Nature Portfolio
2017
|
Sujets: | |
Accès en ligne: | https://doaj.org/article/9b5224f63e73455aa824fe69d58a8a21 |
Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|