Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures

Fabrication methods to pattern thin materials are a critical tool to build molecular scale devices. Here the authors report a selective etching method using XeF2 gas to pattern graphene based heterostructures with multiple active layers and achieve 1D contacts with low contact resistivity of 80 Ω·µm...

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Autores principales:	Jangyup Son, Junyoung Kwon, SunPhil Kim, Yinchuan Lv, Jaehyung Yu, Jong-Young Lee, Huije Ryu, Kenji Watanabe, Takashi Taniguchi, Rita Garrido-Menacho, Nadya Mason, Elif Ertekin, Pinshane Y. Huang, Gwan-Hyoung Lee, Arend M. van der Zande
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2018
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/9e00e5db8f0e48bf96f67c820d1c2ba7
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id	oai:doaj.org-article:9e00e5db8f0e48bf96f67c820d1c2ba7
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spelling	oai:doaj.org-article:9e00e5db8f0e48bf96f67c820d1c2ba72021-12-02T15:33:42ZAtomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures10.1038/s41467-018-06524-32041-1723https://doaj.org/article/9e00e5db8f0e48bf96f67c820d1c2ba72018-09-01T00:00:00Zhttps://doi.org/10.1038/s41467-018-06524-3https://doaj.org/toc/2041-1723Fabrication methods to pattern thin materials are a critical tool to build molecular scale devices. Here the authors report a selective etching method using XeF2 gas to pattern graphene based heterostructures with multiple active layers and achieve 1D contacts with low contact resistivity of 80 Ω·µmJangyup SonJunyoung KwonSunPhil KimYinchuan LvJaehyung YuJong-Young LeeHuije RyuKenji WatanabeTakashi TaniguchiRita Garrido-MenachoNadya MasonElif ErtekinPinshane Y. HuangGwan-Hyoung LeeArend M. van der ZandeNature PortfolioarticleScienceQENNature Communications, Vol 9, Iss 1, Pp 1-9 (2018)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Jangyup Son Junyoung Kwon SunPhil Kim Yinchuan Lv Jaehyung Yu Jong-Young Lee Huije Ryu Kenji Watanabe Takashi Taniguchi Rita Garrido-Menacho Nadya Mason Elif Ertekin Pinshane Y. Huang Gwan-Hyoung Lee Arend M. van der Zande Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
description	Fabrication methods to pattern thin materials are a critical tool to build molecular scale devices. Here the authors report a selective etching method using XeF2 gas to pattern graphene based heterostructures with multiple active layers and achieve 1D contacts with low contact resistivity of 80 Ω·µm
format	article
author	Jangyup Son Junyoung Kwon SunPhil Kim Yinchuan Lv Jaehyung Yu Jong-Young Lee Huije Ryu Kenji Watanabe Takashi Taniguchi Rita Garrido-Menacho Nadya Mason Elif Ertekin Pinshane Y. Huang Gwan-Hyoung Lee Arend M. van der Zande
author_facet	Jangyup Son Junyoung Kwon SunPhil Kim Yinchuan Lv Jaehyung Yu Jong-Young Lee Huije Ryu Kenji Watanabe Takashi Taniguchi Rita Garrido-Menacho Nadya Mason Elif Ertekin Pinshane Y. Huang Gwan-Hyoung Lee Arend M. van der Zande
author_sort	Jangyup Son
title	Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
title_short	Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
title_full	Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
title_fullStr	Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
title_full_unstemmed	Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
title_sort	atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures
publisher	Nature Portfolio
publishDate	2018
url	https://doaj.org/article/9e00e5db8f0e48bf96f67c820d1c2ba7
work_keys_str_mv	AT jangyupson atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT junyoungkwon atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT sunphilkim atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT yinchuanlv atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT jaehyungyu atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT jongyounglee atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT huijeryu atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT kenjiwatanabe atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT takashitaniguchi atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT ritagarridomenacho atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT nadyamason atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT elifertekin atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT pinshaneyhuang atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT gwanhyounglee atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures AT arendmvanderzande atomicallyprecisegrapheneetchstopsforthreedimensionalintegratedsystemsfromtwodimensionalmaterialheterostructures
_version_	1718387040465190912

Atomically precise graphene etch stops for three dimensional integrated systems from two dimensional material heterostructures

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