Structural Color Filters Enabled by a Dielectric Metasurface Incorporating Hydrogenated Amorphous Silicon Nanodisks

Abstract It is advantageous to construct a dielectric metasurface in silicon due to its compatibility with cost-effective, mature processes for complementary metal-oxide-semiconductor devices. However, high-quality crystalline-silicon films are difficult to grow on foreign substrates. In this work,...

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Autores principales: Chul-Soon Park, Vivek Raj Shrestha, Wenjing Yue, Song Gao, Sang-Shin Lee, Eun-Soo Kim, Duk-Yong Choi
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2017
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Acceso en línea:https://doaj.org/article/a2f91f0209514227b8b88463e858b47f
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