Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices

Surface acoustic wave (SAW) can be used as passive wireless sensors in high temperature environments. For such applications, protective layers are crucial and important for the SAW sensors. In this paper, ultra-thin Al2O3 layers prepared by atomic layer deposition (ALD) and RF magnetron sputtering w...

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Autores principales:	Miling Zhang, Jinkai Chen, Weipeng Xuan, Xinyu Song, Hongsheng Xu, Jikai Zhang, Jian Wu, Hao Jin, Shurong Dong, Jikui Luo
Formato:	article
Lenguaje:	EN
Publicado:	Elsevier 2021
Materias:	Surface acoustic waves High temperature ultra-thin film Alumina protective layers Coating materials Mining engineering. Metallurgy TN1-997
Acceso en línea:	https://doaj.org/article/a38f7dbf5551407c8d5cdc3767a04c0d
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spelling	oai:doaj.org-article:a38f7dbf5551407c8d5cdc3767a04c0d2021-11-04T04:31:55ZComparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices2238-785410.1016/j.jmrt.2021.10.081https://doaj.org/article/a38f7dbf5551407c8d5cdc3767a04c0d2021-11-01T00:00:00Zhttp://www.sciencedirect.com/science/article/pii/S2238785421012163https://doaj.org/toc/2238-7854Surface acoustic wave (SAW) can be used as passive wireless sensors in high temperature environments. For such applications, protective layers are crucial and important for the SAW sensors. In this paper, ultra-thin Al2O3 layers prepared by atomic layer deposition (ALD) and RF magnetron sputtering were used to protect SAW devices with platinum (Pt) electrodes and their temperature stability was studied systematically. The devices were thermally treated up to 1150 °C in air, the real-time resistance of Pt resistive tracks with a sputtering Al2O3 protective layer showed much better and improved thermal stability than those without or with an ALD Al2O3 protective layer. Microstructure characterizations showed that the superior temperature stability is attributed to its mixture of amorphous and nano-crystalline nature of the Al2O3 layer deposited by sputtering and full recrystallization at high temperatures. SAW devices with a sputtering Al2O3 protective layer after 1150 °C treatment maintained almost unchanged properties, while those with an ALD Al2O3 protective layer failed to work. Investigation also indicated there exists an optimal thickness for the sputtering Al2O3 layer to achieve best performance and thermal-stability for the SAW devices. Besides, the deposition rate of Al2O3 layer by sputtering is 10 times faster than that by ALD. All the results demonstrate that the sputtering Al2O3 protective layer is more suitable for high temperature SAW device applications owing to its lower cost, higher deposition rate and temperature stability.Miling ZhangJinkai ChenWeipeng XuanXinyu SongHongsheng XuJikai ZhangJian WuHao JinShurong DongJikui LuoElsevierarticleSurface acoustic wavesHigh temperature ultra-thin filmAlumina protective layersCoating materialsMining engineering. MetallurgyTN1-997ENJournal of Materials Research and Technology, Vol 15, Iss , Pp 4714-4724 (2021)
institution	DOAJ
collection	DOAJ
language	EN
topic	Surface acoustic waves High temperature ultra-thin film Alumina protective layers Coating materials Mining engineering. Metallurgy TN1-997
spellingShingle	Surface acoustic waves High temperature ultra-thin film Alumina protective layers Coating materials Mining engineering. Metallurgy TN1-997 Miling Zhang Jinkai Chen Weipeng Xuan Xinyu Song Hongsheng Xu Jikai Zhang Jian Wu Hao Jin Shurong Dong Jikui Luo Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
description	Surface acoustic wave (SAW) can be used as passive wireless sensors in high temperature environments. For such applications, protective layers are crucial and important for the SAW sensors. In this paper, ultra-thin Al2O3 layers prepared by atomic layer deposition (ALD) and RF magnetron sputtering were used to protect SAW devices with platinum (Pt) electrodes and their temperature stability was studied systematically. The devices were thermally treated up to 1150 °C in air, the real-time resistance of Pt resistive tracks with a sputtering Al2O3 protective layer showed much better and improved thermal stability than those without or with an ALD Al2O3 protective layer. Microstructure characterizations showed that the superior temperature stability is attributed to its mixture of amorphous and nano-crystalline nature of the Al2O3 layer deposited by sputtering and full recrystallization at high temperatures. SAW devices with a sputtering Al2O3 protective layer after 1150 °C treatment maintained almost unchanged properties, while those with an ALD Al2O3 protective layer failed to work. Investigation also indicated there exists an optimal thickness for the sputtering Al2O3 layer to achieve best performance and thermal-stability for the SAW devices. Besides, the deposition rate of Al2O3 layer by sputtering is 10 times faster than that by ALD. All the results demonstrate that the sputtering Al2O3 protective layer is more suitable for high temperature SAW device applications owing to its lower cost, higher deposition rate and temperature stability.
format	article
author	Miling Zhang Jinkai Chen Weipeng Xuan Xinyu Song Hongsheng Xu Jikai Zhang Jian Wu Hao Jin Shurong Dong Jikui Luo
author_facet	Miling Zhang Jinkai Chen Weipeng Xuan Xinyu Song Hongsheng Xu Jikai Zhang Jian Wu Hao Jin Shurong Dong Jikui Luo
author_sort	Miling Zhang
title	Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
title_short	Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
title_full	Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
title_fullStr	Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
title_full_unstemmed	Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
title_sort	comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices
publisher	Elsevier
publishDate	2021
url	https://doaj.org/article/a38f7dbf5551407c8d5cdc3767a04c0d
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Comparison of sputtering and atomic layer deposition based ultra-thin alumina protective layers for high temperature surface acoustic wave devices

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