Efficient low-cost solar cells based on ITO-nSi
A vapor phase pyrolysis deposition (VPPD) method has been described in [1] and applied to prepare indium tin oxide (ITO) thin films with thicknesses about 400 nm, with a conductivity of 8.3 • 103 –1 cm–1, and a transparency of 80% in the visible spectral range. The layers have been deposited on the...
Enregistré dans:
| Auteur principal: | |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2016
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/aca8344901b54b14a398384d92a4fc78 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|