Efficient low-cost solar cells based on ITO-nSi
A vapor phase pyrolysis deposition (VPPD) method has been described in [1] and applied to prepare indium tin oxide (ITO) thin films with thicknesses about 400 nm, with a conductivity of 8.3 • 103 –1 cm–1, and a transparency of 80% in the visible spectral range. The layers have been deposited on the...
Guardado en:
Autor principal: | Curmei, Nicolai |
---|---|
Formato: | article |
Lenguaje: | EN |
Publicado: |
D.Ghitu Institute of Electronic Engineering and Nanotechnologies
2016
|
Materias: | |
Acceso en línea: | https://doaj.org/article/aca8344901b54b14a398384d92a4fc78 |
Etiquetas: |
Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!
|
Ejemplares similares
-
Current transport mechanisms in ITO/nSI structures
por: Şerban, Dormidont, et al.
Publicado: (2009) -
Indentation size effect in ITO/Si planar structure under concentrated load action
por: Harea, Evghenii
Publicado: (2007) -
A comparative study of photoconductivity decay in ZnO-based MSM structures and nanowires
por: Rusu, Emil, et al.
Publicado: (2016) -
Thermovision thermographic analysis of photovoltaic conversion efficiency in solar cells
por: Saghinov, L., et al.
Publicado: (2013) -
Solar grade silicon obtaining with application of solar heating
por: Harcenco, Victor
Publicado: (2007)