Nitrogenation of Amorphous Silicon : Reactive Molecular Dynamics Simulations
Since silicon nitride (SiNx) film is more stable than SiO2, silicon nitride, thus it is widely used in semiconductor industry as an insulatorlayer. The study of nitrogenation process of a-Si was performed using molecular dynamics simulations to determine the properties of the bonds created in the st...
Enregistré dans:
| Auteurs principaux: | , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
University of Brawijaya
2019
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/aff25d28df684710aeac9ab2f7810d58 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Soyez le premier à ajouter un commentaire!