Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the...
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | article |
| Language: | EN |
| Published: |
Nature Portfolio
2017
|
| Subjects: | |
| Online Access: | https://doaj.org/article/b191567d24d441f1968fe496631d1708 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture of the collimating lenses. Here we propose broad-beam scanning exposure which employs the latent grating generated continuously during scanning for real-time dynamic fringe locking and thus achieves unlimited recording length. This method is experimentally proved to make high-quality gratings, and is expected to be a new type of interference lithography. |
|---|