Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
Abstract Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the...
Enregistré dans:
| Auteurs principaux: | , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2017
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/b191567d24d441f1968fe496631d1708 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Soyez le premier à ajouter un commentaire!