Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads

Radio frequency-microelectromechanical system (RF-MEMS) switches, which use physical Ohmic contacts, are recently focused for high performance in the high-frequency ranges. Typically, the contact areas of the electrodes in RF-MEMS switches are less than 0.01 mm2, and they generate just very low norm...

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Autores principales:	Yusuke YUKIYOSHI, Yuma YOKOI, Hiroshi KINOSHITA, Masahiro FUJII
Formato:	article
Lenguaje:	EN
Publicado:	The Japan Society of Mechanical Engineers 2016
Materias:	carbon nanotube cnt film electrical contact resistance rf-mems electroplating Mechanical engineering and machinery TJ1-1570
Acceso en línea:	https://doaj.org/article/b2e1e7982cc0458dacf25255834409a0
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spelling	oai:doaj.org-article:b2e1e7982cc0458dacf25255834409a02021-11-26T06:55:31ZElectrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads2187-974510.1299/mej.15-00346https://doaj.org/article/b2e1e7982cc0458dacf25255834409a02016-09-01T00:00:00Zhttps://www.jstage.jst.go.jp/article/mej/3/5/3_15-00346/_pdf/-char/enhttps://doaj.org/toc/2187-9745Radio frequency-microelectromechanical system (RF-MEMS) switches, which use physical Ohmic contacts, are recently focused for high performance in the high-frequency ranges. Typically, the contact areas of the electrodes in RF-MEMS switches are less than 0.01 mm2, and they generate just very low normal loads of less than 1 mN. The limited real contact area of the electrodes leads to high electrical contact resistances and wear on the switches. Carbon nanotube (CNT) films, formed with many vertically aligned CNTs on a silicon substrate, are one candidate electrode material for RF-MEMS switches. However, CNT films have a high electrical contact resistance with metals. In this study, precious-metal electroplating (Ag, Au, Pt, Rh, and Cu) on CNT films was performed to decrease the electrical contact resistances of the films and increase their wear resistances. The contact resistances of the electroplated CNT films as a function of normal loads up to 1 mN were measured by φ2 mm Cu balls. In this study, the Ag-electroplated CNT film with a hydrogen annealing had the lowest electrical contact resistance of 0.10 Ω. Durability experiments of cyclic connection switching were conducted under direct applied voltages of 3 V or 10 V between the films and Cu balls, and with a load of 1 mN for 3 × 105 cycles. The electrical contact resistance of the Ag-electroplated CNT film with the hydrogen annealing was stable during this durability experiment.Yusuke YUKIYOSHIYuma YOKOIHiroshi KINOSHITAMasahiro FUJIIThe Japan Society of Mechanical Engineersarticlecarbon nanotubecnt filmelectrical contact resistancerf-memselectroplatingMechanical engineering and machineryTJ1-1570ENMechanical Engineering Journal, Vol 3, Iss 5, Pp 15-00346-15-00346 (2016)
institution	DOAJ
collection	DOAJ
language	EN
topic	carbon nanotube cnt film electrical contact resistance rf-mems electroplating Mechanical engineering and machinery TJ1-1570
spellingShingle	carbon nanotube cnt film electrical contact resistance rf-mems electroplating Mechanical engineering and machinery TJ1-1570 Yusuke YUKIYOSHI Yuma YOKOI Hiroshi KINOSHITA Masahiro FUJII Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
description	Radio frequency-microelectromechanical system (RF-MEMS) switches, which use physical Ohmic contacts, are recently focused for high performance in the high-frequency ranges. Typically, the contact areas of the electrodes in RF-MEMS switches are less than 0.01 mm2, and they generate just very low normal loads of less than 1 mN. The limited real contact area of the electrodes leads to high electrical contact resistances and wear on the switches. Carbon nanotube (CNT) films, formed with many vertically aligned CNTs on a silicon substrate, are one candidate electrode material for RF-MEMS switches. However, CNT films have a high electrical contact resistance with metals. In this study, precious-metal electroplating (Ag, Au, Pt, Rh, and Cu) on CNT films was performed to decrease the electrical contact resistances of the films and increase their wear resistances. The contact resistances of the electroplated CNT films as a function of normal loads up to 1 mN were measured by φ2 mm Cu balls. In this study, the Ag-electroplated CNT film with a hydrogen annealing had the lowest electrical contact resistance of 0.10 Ω. Durability experiments of cyclic connection switching were conducted under direct applied voltages of 3 V or 10 V between the films and Cu balls, and with a load of 1 mN for 3 × 105 cycles. The electrical contact resistance of the Ag-electroplated CNT film with the hydrogen annealing was stable during this durability experiment.
format	article
author	Yusuke YUKIYOSHI Yuma YOKOI Hiroshi KINOSHITA Masahiro FUJII
author_facet	Yusuke YUKIYOSHI Yuma YOKOI Hiroshi KINOSHITA Masahiro FUJII
author_sort	Yusuke YUKIYOSHI
title	Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
title_short	Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
title_full	Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
title_fullStr	Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
title_full_unstemmed	Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
title_sort	electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads
publisher	The Japan Society of Mechanical Engineers
publishDate	2016
url	https://doaj.org/article/b2e1e7982cc0458dacf25255834409a0
work_keys_str_mv	AT yusukeyukiyoshi electricalcontactresistanceperformanceofpreciousmetalelectroplatedcarbonnanotubefilmsundermicroloads AT yumayokoi electricalcontactresistanceperformanceofpreciousmetalelectroplatedcarbonnanotubefilmsundermicroloads AT hiroshikinoshita electricalcontactresistanceperformanceofpreciousmetalelectroplatedcarbonnanotubefilmsundermicroloads AT masahirofujii electricalcontactresistanceperformanceofpreciousmetalelectroplatedcarbonnanotubefilmsundermicroloads
_version_	1718409740089819136

Electrical contact resistance performance of precious-metal-electroplated carbon nanotube films under micro loads

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