Che, B., Zhang, H., Yang, J., Qi, J., Ding, X., & Zhang, J. (2020). Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE.
Chicago Style (17th ed.) CitationChe, Bowen, Hao Zhang, Jun Yang, Jie Qi, Xingwei Ding, and Jianhua Zhang. Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE, 2020.
MLA (8th ed.) CitationChe, Bowen, et al. Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE, 2020.
Warning: These citations may not always be 100% accurate.