Che, B., Zhang, H., Yang, J., Qi, J., Ding, X., & Zhang, J. (2020). Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE.
Style de citation Chicago (17e éd.)Che, Bowen, Hao Zhang, Jun Yang, Jie Qi, Xingwei Ding, et Jianhua Zhang. Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE, 2020.
Style de citation MLA (8e éd.)Che, Bowen, et al. Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications. IEEE, 2020.
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