Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications
This work reports an alternative atomic layer deposition (ALD) method to fabricate ZnO thin-film transistors (TFTs). The ZnO film is deposited with temperature naturally-cooling process from 200 to 100°C, called a “temperature gradient ZnO (TG-ZnO)”). After optimized...
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| Autores principales: | , , , , , |
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| Formato: | article |
| Lenguaje: | EN |
| Publicado: |
IEEE
2020
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| Materias: | |
| Acceso en línea: | https://doaj.org/article/bc1bc0b4c6fd4ffaa6028db1de49fac2 |
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| Sumario: | This work reports an alternative atomic layer deposition (ALD) method to fabricate ZnO thin-film transistors (TFTs). The ZnO film is deposited with temperature naturally-cooling process from 200 to 100°C, called a “temperature gradient ZnO (TG-ZnO)”). After optimized annealing treatment at 300°C, the TG-ZnO TFT shows an excellent performance compared to those fabricated with traditional constant temperature deposition, including a high saturation mobility <inline-formula> <tex-math notation="LaTeX">$\left(\mu_{\text {sat }}\right)$ </tex-math></inline-formula> of 11.8 cm<sup>2</sup>/Vs, which is 5 times higher than the ZnO TFT, a good on/off-state current ratio <inline-formula> <tex-math notation="LaTeX">$\left(I_{\mathrm{on}} / I_{\mathrm{off}}\right)$ </tex-math></inline-formula> of <inline-formula> <tex-math notation="LaTeX">$1.9 \times 10^{7}$ </tex-math></inline-formula>, a small subthreshold swing (<inline-formula> <tex-math notation="LaTeX">$SS$ </tex-math></inline-formula>) of 175 mV/decade and a threshold voltage <inline-formula> <tex-math notation="LaTeX">$\left(V_{\mathrm{th}}\right)$ </tex-math></inline-formula> of 1.1 V. Meanwhile, the TG-ZnO TFT has better crystallization than 100°C-ZnO and lower oxygen vacancies than 200°C-ZnO. These characters enable the TG-ZnO TFT not only to maintain a high mobility, but also to present a satisfactory <inline-formula> <tex-math notation="LaTeX">$I_{\mathrm{on}} / I_{\mathrm{off}}$ </tex-math></inline-formula> ratio. This promising deposition technique provides a new idea for fabricating TFTs with high mobility. |
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