Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy

Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy

Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.

Guardado en:
Detalles Bibliográficos
Autores principales: Qiushi Huang, Qi jia, Jiangtao Feng, Hao Huang, Xiaowei Yang, Joerg Grenzer, Kai Huang, Shibing Zhang, Jiajie Lin, Hongyan Zhou, Tiangui You, Wenjie Yu, Stefan Facsko, Philippe Jonnard, Meiyi Wu, Angelo Giglia, Zhong Zhang, Zhi Liu, Zhanshan Wang, Xi Wang, Xin Ou
Formato: article
Lenguaje:EN
Publicado: Nature Portfolio 2019
Materias:
Science
Q
Acceso en línea:https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc3180
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Internet

https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc3180

Ejemplares similares