Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy

Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.

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Autores principales:	Qiushi Huang, Qi jia, Jiangtao Feng, Hao Huang, Xiaowei Yang, Joerg Grenzer, Kai Huang, Shibing Zhang, Jiajie Lin, Hongyan Zhou, Tiangui You, Wenjie Yu, Stefan Facsko, Philippe Jonnard, Meiyi Wu, Angelo Giglia, Zhong Zhang, Zhi Liu, Zhanshan Wang, Xi Wang, Xin Ou
Formato:	article
Lenguaje:	EN
Publicado:	Nature Portfolio 2019
Materias:	Science Q
Acceso en línea:	https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc3180
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spelling	oai:doaj.org-article:c20da6ae27a34cc888da2e6b0ffc31802021-12-02T15:36:19ZRealization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy10.1038/s41467-019-10095-22041-1723https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc31802019-06-01T00:00:00Zhttps://doi.org/10.1038/s41467-019-10095-2https://doaj.org/toc/2041-1723Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.Qiushi HuangQi jiaJiangtao FengHao HuangXiaowei YangJoerg GrenzerKai HuangShibing ZhangJiajie LinHongyan ZhouTiangui YouWenjie YuStefan FacskoPhilippe JonnardMeiyi WuAngelo GigliaZhong ZhangZhi LiuZhanshan WangXi WangXin OuNature PortfolioarticleScienceQENNature Communications, Vol 10, Iss 1, Pp 1-9 (2019)
institution	DOAJ
collection	DOAJ
language	EN
topic	Science Q
spellingShingle	Science Q Qiushi Huang Qi jia Jiangtao Feng Hao Huang Xiaowei Yang Joerg Grenzer Kai Huang Shibing Zhang Jiajie Lin Hongyan Zhou Tiangui You Wenjie Yu Stefan Facsko Philippe Jonnard Meiyi Wu Angelo Giglia Zhong Zhang Zhi Liu Zhanshan Wang Xi Wang Xin Ou Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
description	Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.
format	article
author	Qiushi Huang Qi jia Jiangtao Feng Hao Huang Xiaowei Yang Joerg Grenzer Kai Huang Shibing Zhang Jiajie Lin Hongyan Zhou Tiangui You Wenjie Yu Stefan Facsko Philippe Jonnard Meiyi Wu Angelo Giglia Zhong Zhang Zhi Liu Zhanshan Wang Xi Wang Xin Ou
author_facet	Qiushi Huang Qi jia Jiangtao Feng Hao Huang Xiaowei Yang Joerg Grenzer Kai Huang Shibing Zhang Jiajie Lin Hongyan Zhou Tiangui You Wenjie Yu Stefan Facsko Philippe Jonnard Meiyi Wu Angelo Giglia Zhong Zhang Zhi Liu Zhanshan Wang Xi Wang Xin Ou
author_sort	Qiushi Huang
title	Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
title_short	Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
title_full	Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
title_fullStr	Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
title_full_unstemmed	Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
title_sort	realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
publisher	Nature Portfolio
publishDate	2019
url	https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc3180
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Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy

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