Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy
Fabrication of wafer-scale nanogratings for X-ray spectroscopy is difficult especially for very high line densities. The authors use vacancy epitaxy to fabricate sub-50-nm-periodicity gratings, coated with multilayers for efficient operation, for use in ultra-high resolution x-ray spectroscopy.
Enregistré dans:
| Auteurs principaux: | , , , , , , , , , , , , , , , , , , , , |
|---|---|
| Format: | article |
| Langue: | EN |
| Publié: |
Nature Portfolio
2019
|
| Sujets: | |
| Accès en ligne: | https://doaj.org/article/c20da6ae27a34cc888da2e6b0ffc3180 |
| Tags: |
Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!
|
Soyez le premier à ajouter un commentaire!